integrated circuits doubles approximately every two years. The law is named after Intel co-founder Gordon E. Moore, who described the trend in his 1965 paper.[1][2][3] His prediction has proven to be accurate, in part because the law is now used in the semiconductor industry to guide long-term planning and to set targets for research and development.[4] The capabilities of many digital electronic devices are strongly linked to Moore's law: processing speed, memory capacity, sensors and even the number and
Words: 283 - Pages: 2
What is Drain Induced Barrier Lowering? Ideally, drain current Ids should be constant i.e. independent of Vds in saturation region. In reality, Ids increases with Vds in saturation region because of the following two regions: 1) Channel length modulation: As Vds increases, length Leff decreases, hence current increases. 2) Drain Induced Barrier Lowering: As Vds increases, Vt decreases, hence current increases. Drain Induced Barrier Lowering (DIBL) is a decrease in threshold voltage
Words: 1109 - Pages: 5
10-14 F cm-1 = 300 K = kT/q = 0.025 V = 25 mV = 1.5 x 1010 cm-3 = 11.7 = 3.9 Summary of Equations I. Semiconductor Physics Equation Remarks Quantity Law of mass action p0n0 = ni2 p + ND = n + N A ni = 1.5 × 1010 cm-3 for Si at T = 300 K Charge neutrality Carrier concentrations in p-type semiconductor at thermal equilibrium (cm-3) Carrier concentrations in n-type semiconductor at thermal equilibrium (cm-3) Drift current density (A cm-2) p p0 = N A n p0 = ni2 NA ni2 ND T =
Words: 1542 - Pages: 7
Advanced Inorganic Chemistry I: Report Engineering the Optical Response of the Titanium-MIL-125 Metal-Organic Framework through Ligand Functionlization , 2013, 135 (30), pp 10942–10945 Advanced Inorganic Chemistry I: Report Engineering the Optical Response of the Titanium-MIL-125 Metal-Organic Framework through Ligand Functionlization , 2013, 135 (30), pp 10942–10945 Valeriya Chernikova
Words: 2461 - Pages: 10
Creation of Silicon Chips D'yara L.Williams South Carolina State University CS 304 - Introduction to Computer Organizatikns & Architecture Dr. Y. Kim Feburary 25, 2015 Did you know that microprocessors today have more than 30 layers of complex circuits compared to the 5 layered circuit discovered in 1971? Silicon chips are also known as a monolithic integrated circuits, die, or processors. They’re miniature electronic brains that are everywhere in the
Words: 1274 - Pages: 6
INTRODUCTION With the rapid progress of technology and science, nanotechnology becomes a prominent accomplishment of the humanity. The ability to observe and comprehend the nanomaterial has a beneficial human to extend our knowledge in a variety range of industries and scientific endeavors. Nanotechnology is defined as a structure that conducted the size of one nanometer to one hundred nanometers and it is invisible to the human eye. Nanotechnology allows the scientists to manipulate one particular
Words: 1036 - Pages: 5
the United States, located in California. They’re headed by their CEO Brian Krzanich. They are known for being “computer chip makers”, which is correct, they are semiconductor chip makers. Because of their products, they are considered of the largest and highest valued semiconductor chip makers throughout the world and in the semiconductor industry. Cisco Cisco is in the Networking industry, and they do everything from design to sell networking equipment. John Chambers is the CEO and chairman of
Words: 265 - Pages: 2
electrons forming a lowdimensional layer, residing in a semiconductor film called a quantum well. The layer of electrons is called low-dimensional because it forms a quasi-two-dimensional electron system, a layer of electrons so thin that the third dimension is negligible. To perform ACT, a sound wave, called a surface acoustic wave (SAW) due to its propagation in two dimensions, is passed through the semiconductor film. Properties of the semiconductor result in an acoustoelectric
Words: 1783 - Pages: 8
wafer is a thin slice of silicon crystal used in the fabrication of integrated circuits and other micro devices. Silicon is widely used in the semiconductor industry because it remains a semiconductor at higher temperatures than other semiconductor materials and because its native oxide is easily grown. Once grown its native oxide forms a better semiconductor/dielectric interface than other materials. The purpose of this article is to give a brief and basic explanation of the many different silicon
Words: 859 - Pages: 4
Gate Effect on Nanowire Tunneling Field Effect Transistor (FET) Bai Ke, Department of Electrical & Computer Engineering, National University of Singapore Abstract—The simulation study on Si Nanowire Tunneling Field-Effect Transistor (TFET) has been conducted in this project. A device performance comparison was carried out between Double Gate (DG) Tunneling Field-Effect Transistor and Gate All Around Si Nanowire (GAA SiNW) Tunneling Field-Effect Transistor. The device physics and electrical characteristics
Words: 5566 - Pages: 23
